Obey USE_MY_METRICS in compound glyphs

* src/sfnt.c (struct sfnt_compound_glyph_context): New fields
holding the positions of both phantom points.
(sfnt_decompose_compound_glyph): New argument METRICS_RETURN;
return the metrics of components with USE_MY_METRICS within this
field.
(sfnt_decompose_glyph): New argument METRICS_RETURN, which
serves the same purpose.
(sfnt_build_glyph_outline): Apply glyph advance and origin
distortion to METRICS, and return the metrics as altered by
compound glyphs in there.
(sfnt_lookup_glyph_metrics): Trim away two unused parameters,
PIXEL_SIZE and HEAD, whose functionality has been superseeded by
sfnt_scale_metrics and the implicit scaling the interpreter
performs.
(sfnt_interpret_compound_glyph_2): Save phantom points within
fields provided to that end in CONTEXT.
(sfnt_interpret_compound_glyph_1): Save and source phantom
points for each glyph to and from the context.
(sfnt_test_get_metrics, main): Adjust tests correspondingly.

* src/sfnt.h: Update prototypes.

* src/sfntfont.c (sfntfont_get_metrics): Remove obsolete
parameters.
(sfntfont_get_glyph_outline): Don't change temp by the metrics
distortions, which is now the task of sfnt_decompose_glyph.

1 files changed, 1 insertions, 2 deletions

diff --git a/src/sfnt.h b/src/sfnt.h
index 576d287e8e6..8f6d6bf427b 100644
--- a/src/sfnt.h
+++ b/src/sfnt.h
@@ -1524,11 +1524,10 @@ extern struct sfnt_raster *sfnt_raster_glyph_outline_exact (PROTOTYPE);
 extern struct sfnt_hmtx_table *sfnt_read_hmtx_table (PROTOTYPE);
 #undef PROTOTYPE
 
-extern int sfnt_lookup_glyph_metrics (sfnt_glyph, int,
+extern int sfnt_lookup_glyph_metrics (sfnt_glyph,
                                       struct sfnt_glyph_metrics *,
                                       struct sfnt_hmtx_table *,
                                       struct sfnt_hhea_table *,
-                                      struct sfnt_head_table *,
                                       struct sfnt_maxp_table *);
 
 extern void sfnt_scale_metrics (struct sfnt_glyph_metrics *,